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Technology Services:


Failure Analysis and Materials Characterization

Analysis and Characterization Capabilities

  • IC Interconnect Analysis (SEM, Optical Imaging)
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  • Package deconstruction analysis (X-ray Radiography, SEM, Optical Imaging)
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  • Interfacial structure (SEM, Optical Cross-sections)
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  • Elemental analysis and mapping (SEM, EDS)
  • Microstructure and phase analysis (SEM, EDS)
  • Grain structure, grain size distribution (SEM, image analysis)
  • Failure interface identification (SEM, EDS, Optical cross-sections)
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  • Micro-hardness characterization of materials and layers (SEM)
  • Thermal conductivity (Laser Flash)
  • Heat capacity (Laser Flash, Calorimetry)
  • Interfacial thermal resistance (laser flash)
  • Electrical resistivity of metallization systems (4 point probe)
  • Dielectric breakdown voltage
  • Dielectric loss and dielectric constant of electronic materials and structures up to 26GHz (Network analyzer)
  • Surface roughness (Laser profilometer)
  • Surface curvature (Laser or stylus profilometer)
  • Wirebond pull strength
  • Stress/strain behavior of materials (Instron mechanical tester)
  • Lead pull strength (Instron mechanical tester)

Analysis Equipment

  • Scanning Electron Microscope
  • EDS
  • X Ray Radiography
  • High Resolution Optical Microscopes
  • Micro Hardness Tester
  • Image Analysis Software
  • Metallographic Laboratory
  • Laser Profilometer
  • Instron Mechanical Tester
  • Hermeticity Tester
  • HAST
  • T Cycle Unit
  • Temperature/Humidity Chamber
  • Laser Flash Thermal Conductivity
  • Electrical Conductivity
  • Electrical Isolation/Dielectric Breakdown
  • Capacitance Meter
  • Thermal Imaging (IR Camera*
  • Network Analyzer*
  • Atomic Force Microscopy*
  • Acoustic Microscopy*
  • Auger Spectroscopy*
  • FTIR and ATR*
  • XPS/SIMS*
  • UV/Vis Spectroscopy*
  • TGA/TMA*
  • DSC*
  • GC and Mass Spectrometer*

* With CMC partner laboratories (CMC manages all tests)

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